发明名称 |
Wafer drying methods of Marangoni type and apparatus suitable therefor |
摘要 |
A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.
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申请公布号 |
US6896743(B2) |
申请公布日期 |
2005.05.24 |
申请号 |
US20020041227 |
申请日期 |
2002.01.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG JAE-HYUNG;KWON YOUNG-MIN;LEE JONG-JAE;JUNG DONG-HOON |
分类号 |
H01L21/304;H01L21/00;(IPC1-7):B08B3/00;F26B3/06 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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