发明名称 Semiconductor device and manufacturing method thereof
摘要 A semiconductor device having a metal layer at the peripheral area surrounding an element forming area formed on a semiconductor substrate. This metal layer may be connected to the grounding potential or the power potential. The peripheral area is a scribing line area for example. The metal layer may be formed simultaneously with the formation of a bump within the element forming area.
申请公布号 US6897091(B2) 申请公布日期 2005.05.24
申请号 US20020145892 申请日期 2002.05.16
申请人 ROHM CO., LTD. 发明人 HIKITA JUNICHI;NAKAGAWA YOSHIKAZU;KUMAMOTO NOBUHISA
分类号 H01L21/301;H01L21/60;H01L23/485;H01L23/50;H01L25/065;H01L25/07;H01L25/18;(IPC1-7):H01L21/44 主分类号 H01L21/301
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