发明名称 Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens
摘要 A magnetic pole of a magnetic field type lens is divided into a first magnetic pole section that is at ground potential, and a second magnetic pole section facing a sample and to which a negative high voltage is applied, the first magnetic pole section and the second magnetic pole section 212 being electrically insulated from each other, and an electric field type bi-potential lens is made up of an electrode attached to the first magnetic pole section so as to surround an electron beam path. High resolution observation with small chromatic aberration factor Cs, Cc is made possible without forming a positive high voltage section inside an electron beam path of a lens barrel.
申请公布号 US6897450(B2) 申请公布日期 2005.05.24
申请号 US20010978258 申请日期 2001.10.15
申请人 SII NANOTECHNOLOGY INC. 发明人 YONEZAWA AKIRA
分类号 H01J37/145;H01J37/28;(IPC1-7):H01J37/20 主分类号 H01J37/145
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