发明名称 |
Apparatus and method for repairing resist latent images |
摘要 |
A method and an apparatus for repairing resist latent image on a wafer are disclosed. In the method, an image scanner equipped with a first and a second wafer carrier, and a primary imaging column and a secondary imaging column is utilized to conduct the processes of imaging a resist latent image on a first wafer and repairing a defect in a resist latent image on a second wafer positioned on a second wafer carrier simultaneously. The primary imaging column and the secondary imaging column may be situated in the same vacuum chamber to facilitate operation.
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申请公布号 |
US6897455(B2) |
申请公布日期 |
2005.05.24 |
申请号 |
US20020041270 |
申请日期 |
2002.01.07 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
LIN BURN J. |
分类号 |
G03F7/20;(IPC1-7):H01J37/317 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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