| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation, excellent basic properties as a resist such as sensitivity, resolution, dry etching resistance and pattern shape, particularly excellent solubility in a resist solvent, and reducing the roughness of a side wall of a pattern after development. <P>SOLUTION: The radiation-sensitive resin composition contains: an acid-dissociating group-containing resin which is alkali-insoluble or slightly alkali-soluble but becomes readily alkali-soluble by the action of an acid; and a radiation-sensitive acid generator. The acid-dissociating group-containing resin is obtained by polymerizing (i) a compound represented by formula (1) or (ii) a mixture of a compound represented by the formula (1) and one or more compounds selected from a radical polymerization initiator and a ditelluride compound represented by formula (2). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
