发明名称 PHOTOLITHOGRAPHING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To draw an image by assigning an image from a bit map memory to a plurality of laser light sources to divide the image, exposing a photosensitive material and joining the divided images into one integrated image. <P>SOLUTION: An optical head 1 is constituted by disposing a plurality of pairs each comprising a laser light source and an optics projecting a laser spot. The imaging position of the spot from each laser light source installed in the head 1 is measured by a displacement detecting section 7 to determine a shift amount from a reference position and to memorize the shift amount in a memory section 23. The memorized value is read out by a control unit 8, and the shift amount in the y direction is compared with a current position of the sensitive material 2 which is moved by a command of a driving control section 4. The data from a bit map memory 39 read out based on the comparison result and the shift amount in the x direction of the memorized value are sent to a light source control section 9 to generate a light emission command signal for each laser light source. The laser light source receiving the command exposes the photosensitive material 2 disposed at a position opposing to the optical head. The divided images for each of the laser light source are joined and added to obtain one photolithographic image. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005128329(A) 申请公布日期 2005.05.19
申请号 JP20030364903 申请日期 2003.10.24
申请人 OPCELL CO LTD 发明人 KOMATA KIMIO;ISHIZUKA YUKIO
分类号 B41J2/44;B41J2/45;B41J2/455;G03F7/20;G03F9/00;(IPC1-7):G03F7/20 主分类号 B41J2/44
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