发明名称 RESIN, ITS PREPARATION METHOD AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition which shows good resist performance such as sensitivity. <P>SOLUTION: A resin comprises at least one polymerization unit chosen from the group consisting of a polymerization unit derived from 3-hydroxy-1-adamanthyl (meth)acrylate, a polymerization unit derived from 3,5-dihydroxy-1-adamanthyl (meth)acrylate or the like and further, comprises a polymerization unit of formula (II). The resin itself is insoluble or hardly soluble in an aqueous alkaline solution but becomes soluble in the aqueous alkaline solution when treated with an acid. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005126706(A) 申请公布日期 2005.05.19
申请号 JP20040289729 申请日期 2004.10.01
申请人 SUMITOMO CHEMICAL CO LTD 发明人 FUJI YUSUKE;TAKADA YOSHIYUKI;YOSHIDA ISAO
分类号 G03F7/039;C08F220/28;H01L21/027 主分类号 G03F7/039
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