摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition which shows good resist performance such as sensitivity. <P>SOLUTION: A resin comprises at least one polymerization unit chosen from the group consisting of a polymerization unit derived from 3-hydroxy-1-adamanthyl (meth)acrylate, a polymerization unit derived from 3,5-dihydroxy-1-adamanthyl (meth)acrylate or the like and further, comprises a polymerization unit of formula (II). The resin itself is insoluble or hardly soluble in an aqueous alkaline solution but becomes soluble in the aqueous alkaline solution when treated with an acid. <P>COPYRIGHT: (C)2005,JPO&NCIPI |