发明名称 SCANNING ALIGNER AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To improve the following precision and/or synchronous precision of a stage in focal drive and/or leveling drive by solving a problem caused by in excessive limitation. SOLUTION: Focus leveling sensors 13-15 measure field positions of a wafer 5 on a stage. A target orbital setting portion 71 creates the drive schedule of the stage for adjusting the field position of the wafer at the time of exposure scanning based on the measurement result. A driving volume limiting value setting portion 72 sets a limiting value to the drive of the stage for the adjustment of the wafer field position, based on a drive state at the time of exposure scan of the stage which is obtained from a stage drive profile 112. A target starting correction portion 73 changes the drive schedule by the set limiting value. A jogging stage driving signal formation portion 74 executes stage drive for adjusting the field position of the wafer by the changed drive schedule. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005129595(A) 申请公布日期 2005.05.19
申请号 JP20030361135 申请日期 2003.10.21
申请人 CANON INC 发明人 AKIMOTO SATOSHI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址