| 摘要 |
An ion source is provided, which generates or emits an ion beam which may be used to deposit a layer on a substrate, or the perform other functions. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the cathode(s) is maintained or kept at a reference potential(s) other than ground for at least a period of time. This may be done, for example and without limitation, by electrically connecting a zener diode (single or double type, for example), thyristor (actively), or the like to the cathode. Thus, the ion source can be made so that it does not react adversely to its environment, and/or undesirable arcing between the anode and cathode can be reduced thereby improving ion source operation.
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