| 摘要 |
A charged-particle multi-beam exposure apparatus ( 1 ) for exposure of a target ( 41 ) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target ( 41 ). For each particle beam an illumination system ( 10 ), a pattern definition means ( 20 ) and a projection optics system ( 30 ) are provided. The illuminating system ( 10 ) and/or the projection optics system ( 30 ) comprise particle-optical lenses having lens elements (L 1 , L 2 , L 3 , L 4 , L 5 ) common to more than one particle beam. The pattern definition means ( 20 ) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target ( 41 ), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
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