| 发明名称 |
OPTICAL PROCESS MONITORING DEVICE, OPTICAL PROCESS MONITORING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical process monitoring device generating no noise in a detected waveform spectrum. SOLUTION: This device is equipped with a polarizer 60 for polarizing inspection light hν<SB>i</SB>and a monitoring window 54 arranged so that the optical axis A is coincident on a plane P of polarization of the inspection light hν<SB>i</SB>. COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005127797(A) |
申请公布日期 |
2005.05.19 |
| 申请号 |
JP20030362134 |
申请日期 |
2003.10.22 |
| 申请人 |
TOSHIBA CORP |
发明人 |
SAKAI TAKAYUKI;KIBE MASANOBU;OIWA NORIHISA |
| 分类号 |
G01B11/02;G01B11/06;G01B11/22;G01N15/02;H01L21/3065;H01L21/66;H01L21/768;(IPC1-7):G01B11/02;H01L21/306 |
主分类号 |
G01B11/02 |
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