POSITION DETECTION METHOD, EXPOSURE METHOD, POSITION DETECTION DEVICE, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD

摘要

It is possible to detect position information on a plurality of partitioned areas arranged on a object according to a model. AIC(M') of a model M' having a small degree of freedom of parameters is compared to AIC(M) of a model M having a large degree of freedom of parameters and the smaller one is selected as a model of EGA (step 502). When the model M is selected and its residual is not smaller than a predetermined value, a model in which all the coefficients having a greater degree of freedom of parameters than the model M are parameters is selected. When the number of valid samples is smaller than the degree of freedom of parameters in this model, the number of valid samples is increased and the sample shot is additionally measured. The coefficient of the model currently selected is reflected in the knowledge available in advance when performing wafer alignment next time (step 524). According to the degree of freedom of parameters of the current model, the number of valid samples is increased or decreased (step 508 or step 518).