发明名称 SHAPE PROFILE MEASURING DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING IT
摘要 PROBLEM TO BE SOLVED: To provide a shape profile measuring device capable of realizing highly accurate measurement of a fine short-wavelength pattern by imparting a scatterometer device for solving the problem of grazing incidence in the case of using a reflection type objective lens and the problem of chromatic aberration in the case of using the reflection type objective lens. SOLUTION: In this shape profile measuring device for performing shape profile measurement by collation between a measured spectral waveform and a simulation waveform, vertical incidence can be realized by using one concave mirror 21 and one convex mirror 22 as an image formation system and by using an optical system wherein the image side is on the same side as the object side to the concave mirror 21, namely, by using an Offner type lens as the reflection type objective lens, and since only a vertical reflection component can be detected, the collation between the simulation waveform and the measured waveform becomes possible, to thereby realize highly-accurate short-wavelength measurement. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005127830(A) 申请公布日期 2005.05.19
申请号 JP20030363105 申请日期 2003.10.23
申请人 HITACHI LTD 发明人 YOSHITAKE YASUHIRO;MATSUMOTO SHUNICHI
分类号 G01B11/24;G01B11/30;G03F7/20;H01L21/027;H01L21/66;(IPC1-7):G01B11/24 主分类号 G01B11/24
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