发明名称 Crystal manufacturing method
摘要 A method of growing a crystal (for example, a GaN system compound semiconductor crystal) on a substrate at least includes forming a first crystalline layer (a GaN system buffer layer), forming a second crystalline layer (a GaN system intermediate layer) and forming a third crystalline layer (a GaN system thick film layer). The three crystalline layers are respectively reared on conditions different from one another.
申请公布号 US2005106883(A1) 申请公布日期 2005.05.19
申请号 US20040504527 申请日期 2004.08.16
申请人 SASAKI SHINICHI;NAKAMURA MASASHI;SATO KENJI 发明人 SASAKI SHINICHI;NAKAMURA MASASHI;SATO KENJI
分类号 C30B29/38;C30B25/02;C30B25/18;H01L21/20;H01L21/205;(IPC1-7):H01L21/302;H01L21/461 主分类号 C30B29/38
代理机构 代理人
主权项
地址