发明名称 Measuring or testing lateral dimension or volume of recess in layer on substrate surface, or properties of materials in recess, by irradiating and analyzing interaction of radiation with recess
摘要 <p>The method involves applying electromagnetic scanning radiation to the layer with the recess, with a wavelength larger than the lateral dimension of the recess. The response radiation is received and the interaction of the radiation with the layer is used to determine characteristic data for derivation of the dimensions or volume of the recess and the properties of material in the recess. An independent claim is included for a method of manufacturing a component with a recess.</p>
申请公布号 DE10346850(A1) 申请公布日期 2005.05.19
申请号 DE2003146850 申请日期 2003.10.09
申请人 INFINEON TECHNOLOGIES AG 发明人 MANTZ, ULRICH;WEIDNER, PETER;WIENHOLD, RALPH;GUITTET, PIERRE-YVES
分类号 G01B11/22;G01B11/30;G01N21/84;(IPC1-7):G01B11/24;G01N21/88;H01L21/66;B82B3/00 主分类号 G01B11/22
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