发明名称 |
METHOD FOR IN-SITU MONITORING OF PATTERNED SUBSTRATE PROCESSING USING REFLECTOMETRY |
摘要 |
A method of determining a parameter of interest during fabrication of a patterned substrate includes illuminating at least a portion of the patterned substrate with a normal incident light beam, obtaining a measured net reflectance spectrum of the portion of the patterned substrate from a normal reflected light beam, calculating a modeled net reflectance spectrum of the portion of the patterned substrate, and determining a set of parameters that provides a close match between the measured net reflectance spectrum and the modeled net reflectance spectrum. The modeled net reflectance spectrum is calculated as a weighted incoherent sum of reflectances from n >= 1 different regions constituting the portion of the patterned substrate, wherein the reflectance of each of the n different regions is a weighted coherent sum of reflected fields from k >= 1 laterally-distinct areas constituting the region.
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申请公布号 |
KR20050047098(A) |
申请公布日期 |
2005.05.19 |
申请号 |
KR20057002410 |
申请日期 |
2005.02.12 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
PERRY, ANDREW, J.;VENUGOPAL, VIJAYAKUMAR, C. |
分类号 |
G01B11/02;G01B11/06;G01N21/00;G01N21/27;G01N21/45;H01L21/027;H01L21/3065;H01L21/334;H01L21/8242;H01L27/108;(IPC1-7):H01L21/306;H01L21/66 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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