发明名称 NEGATIVE BLUE-VIOLET LASER PHOTOSENSITIVE COMPOSITION, AND IMAGE FORMING MATERIAL, IMAGE FORMER AND METHOD OF IMAGE FORMATION USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative blue-violet laser photosensitive composition that is highly sensitive to laser beams of blue-violet region, excels in not only safe light properties under a yellow light but also the resolution and rectangularity of obtained image, and is suitable for use in direct lithography, and to provide an image forming material, an image former and a method of image formation using the same. <P>SOLUTION: In the negative blue-violet laser photosensitive composition, the minimum exposure intensity at which the exposure by blue-violet laser beams causes the residual film ratio to be &ge;90% is &le;40 mJ/cm<SP>2</SP>, and with respect to a residual film ratio-exposure intensity curve obtained by plotting the residual film ratio at exposed part [t(%)] against the logarithm of exposure intensity by blue-violet laser beams [logE (mJ/cm<SP>2</SP>)], the &gamma; value of straight line binding point at a residual film ratio of 15% with point at a residual film ratio of 80%, t=&gamma;logE+&delta;, is &ge;4.0&times;10<SP>2</SP>. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005128508(A) 申请公布日期 2005.05.19
申请号 JP20040277777 申请日期 2004.09.24
申请人 MITSUBISHI CHEMICALS CORP 发明人 MIZUKAMI JUNJI;KAMEYAMA YASUHIRO;TOSHIMITSU ERIKO;MIZUHO YUUJI
分类号 G03F7/004;C08F2/44;C08F20/18;G03F7/028;G03F7/26;H01L21/027 主分类号 G03F7/004
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