| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for suppressing the influence of the pollution of exposure atmosphere suitable for use in the manufacture of a device having a fine pattern such as a semiconductor device etc. SOLUTION: This aligner has a plurality of optical elements and comprises a projection optical system for leading the light from an original to an exposed object, a first stage on which the exposed object is placed, a first vacuum chamber including the first stage, and a second vacuum chamber adjacent to the first vacuum chamber which includes some optical elements from among the plurality of optical elements and communicates with the first vacuum chamber via a first opening. The pressure in the second vacuum chamber is made higher than that in the first vacuum chamber. COPYRIGHT: (C)2005,JPO&NCIPI
|
