发明名称 Stabilization of electronegative plasmas with feedback control of RF generator systems
摘要 A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.
申请公布号 US2005103439(A1) 申请公布日期 2005.05.19
申请号 US20040020376 申请日期 2004.12.22
申请人 APPLIED SCIENCE AND TECHNOLOGY, INC. 发明人 GOODMAN DANIEL
分类号 H05H1/00;C23F4/00;H01J37/32;H05H1/46;(IPC1-7):H01L21/306 主分类号 H05H1/00
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