发明名称 |
Stabilization of electronegative plasmas with feedback control of RF generator systems |
摘要 |
A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.
|
申请公布号 |
US2005103439(A1) |
申请公布日期 |
2005.05.19 |
申请号 |
US20040020376 |
申请日期 |
2004.12.22 |
申请人 |
APPLIED SCIENCE AND TECHNOLOGY, INC. |
发明人 |
GOODMAN DANIEL |
分类号 |
H05H1/00;C23F4/00;H01J37/32;H05H1/46;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|