| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem of a conventional ceramic heater used for mainly heating wafers that cannot have obtained requisite soaking performance and a temperature response due to a temperature variation. SOLUTION: The ceramic heater includes a heater unit with a ceramic plate body provided with a resistance heater on one principal side and with the ceramic plate body provided with a wafer heating face on the other principal side; a feeding terminal for supplying power to the resistance heater; a case connected to the ceramic plate body in a way of enclosing the feeding terminal; a contact member for supporting the peripheral part of the ceramic plate body in annular contact and connected to the case, with the one major side provided with a non heat generation region around the ceramic plate body outside a circumscribed circle of the resistance heater wherein no resistance heater exists; and a nozzle cooling the ceramic plate body provided with the case, and an infrared ray reflectance of 80% or over as selected for the inner face of the case. COPYRIGHT: (C)2005,JPO&NCIPI
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