| 摘要 |
PROBLEM TO BE SOLVED: To improve drawing accuracy by suppressing degradation in pattern formation accuracy due to a variation in beam resolution caused by space charge effects. SOLUTION: A charged beam drawing apparatus includes a mechanism for forming a charged beam emitted from a charged beam source 11 into a desired shape by using at least two forming apertures 12 and 14, divides a pattern to be formed on a specimen surface into a plurality of figures which can be formed by the beam forming mechanism, shot-draws each divided figure, and also draws an outline of the pattern by using a forming beam with a constant area. It adjusts the focus of the beam by using the forming beam with a constant area to be used in drawing the outline of the pattern. COPYRIGHT: (C)2005,JPO&NCIPI
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