| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a carrier causing little adverse influence such as a variation in flatness, parallelism and the thickness, by enhancing polishing efficiency, while restraining damage to a work. <P>SOLUTION: This carrier polishes the work by rotating the work together with an abrasive between an upper surface plate and a lower surface plate, by holding the work W in a plurality of work storage holes 32 formed at a predetermined interval. The work storage holes form a work storage area 321 mutually fitted to a shape of the work, and a void area 322 for gradually narrowing a width from the work storage area. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
