| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which ensures small surface roughness and line edge roughness during etching and has excellent resolution and a wide focal-depth range, and to provide a method for forming a resist pattern. <P>SOLUTION: The positive resist composition contains a resin (A), an acid generating agent (B) and an organic solvent (C). The resin ingredient (A) has both of a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester, and has a structural unit containing a polycyclic group-containing acid-dissociating dissolution-inhibiting group and derived from a (meth)acrylate ester, a structural unit containing a lactone-containing monocyclic or polycyclic group and derived from a (meth)acrylate ester, and a structural unit containing a hydroxyl group-containing polycyclic group and derived from a (meth)acrylate ester, and further contains a structural unit (a4) containing a polycyclic group excluding the above acid-dissociating dissolution-inhibiting group, the above lactone-containing monocyclic group or polycyclic group and the above hydroxyl group-containing polycyclic group, and derived from a (meth)acrylate ester. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
