| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a new fluoropolymeric compound excellent in transparency to radiations of ≤200 nm wavelength, especially ≤160 nm wavelength, adhesion to substrate, affinity for developing liquid, dry etching resistance, or the like, thus useful as a base resin for radiation-sensitive resists. <P>SOLUTION: The polymeric compound has a weight-average molecular weight of 1,000-500,000 and comprises recurring units each having a partial structure represented by formula(1) ( wherein, R<SP>1</SP>is a single bond or a 1-20C straight-chain, branched or cyclic alkylene or fluoroalkylene group; and R<SP>2</SP>and R<SP>3</SP>are each H or a 1-20C straight-chain, branched or cyclic alkyl or fluoroalkyl group, wherein at least one of R<SP>2</SP>and R<SP>3</SP>contains one or more fluorine atoms ). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
