ABERRATION MEASUREMENT DEVICE, ALIGNER, ABERRATION MEASUREMENT METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide equipment which is capable of measuring the aberration of a projection optical system with high accuracy. SOLUTION: Wave front aberrations at measuring points in a projection field of view of the projection optical system are measured through processing steps 117 to 123, and the amount of misalignment of a wave front sensor is detected by an image photographed by a reticle alignment detection system through steps 127 to 131. These processing are carried out at a plurality of measuring points, and a component corresponding to the misalignment of the wave front sensor is eliminated from a distortion component as the whole inclination component of the wave front at each measuring point in a step 137. COPYRIGHT: (C)2005,JPO&NCIPI