发明名称 PHOTOSENSITIVE MATERIAL DEVELOPMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive material development apparatus capable of changing only development time while keeping fixing time and washing time regular by adjusting immersion time in a developing solution by switching a conveyance path. SOLUTION: The photosensitive material development apparatus 100 has a plurality of conveyance rollers 11 for conveying a photosensitive material along a conveyance path P in a processing tank 21, a plurality of conveyance path switching means 12 disposed in the conveyance path, and a driving means 16 capable of driving so that the conveyance path is adjusted to a prescribed length by switching each of the plurality of conveyance path switching means 12 between a first position where the photosensitive material is conveyed along the conveyance path and a second position where it is conveyed in a shortcut conveyance path, wherein the photosensitive material is conveyed along a shortcut conveyance path P by sequentially switching the conveyance path switching means 12 by driving a plurality of switching drives 17a, 17b, 17c axially arranged at prescribed intervals in the axial direction of a driving shaft 18a. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005128075(A) 申请公布日期 2005.05.19
申请号 JP20030360731 申请日期 2003.10.21
申请人 FUJI PHOTO FILM CO LTD 发明人 IWASAKI HIDEO
分类号 G03D3/08;B65H5/06;B65H29/58;(IPC1-7):G03D3/08 主分类号 G03D3/08
代理机构 代理人
主权项
地址