Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices

摘要

An exposure method includes an exposure step and a measurement step. The exposure step transfers a circuit pattern of a mask onto a photosensitive substrate via an optical system. The mask includes a circuit pattern and an inspection pattern to be used for a measurement of a line width of the pattern transferred to the substrate. The measurement step measures, prior to the exposure step, using the inspection pattern which is formed on the mask to be used in the exposure step, a line width of the pattern to be transferred to the substrate.