发明名称 |
BEAM HOMOGENIZER, LASER IRRADIATION SYSTEM, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To solve the problem of change in energy distribution of a beam spot on an irradiated surface at change in laser emission condition or at the case before and after maintenance. SOLUTION: In an optical system for forming a rectangular beam spot, an optical system that unifies longitudinal or lateral energy distribution of a rectangular beam spot on an irradiated surface is replaced by an optical element having a curved surface pattern on an injection side face of a laser beam and two reflective faces opposed to each other. The injection side face is a surface forming the optical element, and defined as a surface that is disposed at an injection side of the laser beam, through which the laser beam injects into the optical element. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005129916(A) |
申请公布日期 |
2005.05.19 |
申请号 |
JP20040282947 |
申请日期 |
2004.09.29 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
MORIWAKA TOMOAKI |
分类号 |
H01L21/20;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):H01L21/268 |
主分类号 |
H01L21/20 |
代理机构 |
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