发明名称 Insulated gate field-effect transistor having III-VI source/drain layer(s)
摘要 A transistor includes one or more channel taps containing a stack consisting at least in part of a semiconductor an interfacial III-VI layered compound and a conductor. The III-VI compound consists primarily of atoms from Groups IIIA-B and from Group VIA of the Periodic Table of the Elements in an approximate 1:1 ratio. These materials may be formed as layers of covalently bonded elements from Groups IIIA-B and covalently bonded Group VIA elements, adjacent and respective planes of which may be bonded by Van der Waals forces (e.g., to form a single bilayer consisting of a single plane of atoms from Groups IIIA-B and a single plane of Group VIA atoms). One particular III-VI material from which the interfacial layer is made, especially for p-channel transistors, is GaSe. Other III-VI compounds, whether pure compounds or alloys of pure compounds, may also be used.
申请公布号 US2005104137(A1) 申请公布日期 2005.05.19
申请号 US20040010048 申请日期 2004.12.09
申请人 FAULKNER CARL;CONNELLY DANIEL J.;GRUPP DANIEL E. 发明人 FAULKNER CARL;CONNELLY DANIEL J.;GRUPP DANIEL E.
分类号 H01L21/28;H01L29/04;H01L29/786;H01L31/119;(IPC1-7):H01L31/119 主分类号 H01L21/28
代理机构 代理人
主权项
地址
您可能感兴趣的专利