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发明名称
Halbleiterbauelement mit mindestens einem pn-UEbergang und mit einer Oberflaechenschicht aus Siliziumoxyd und Verfahren zum Herstellen
摘要
申请公布号
DE1211335(B)
申请公布日期
1966.02.24
申请号
DE1962J022108
申请日期
1962.07.16
申请人
INTERMETALL GESELLSCHAFT FUER METALLURGIE;ELEKTRONIK M.B.H.
发明人
JUST DR. DIETER;RUEFENACHT RICHARD
分类号
H01L21/00;H01L21/316
主分类号
H01L21/00
代理机构
代理人
主权项
地址
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