发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is provided comprising a substrate table WT for holding a substrate W, a projection system PL for projecting the patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion. <IMAGE>
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申请公布号 |
EP1531364(A2) |
申请公布日期 |
2005.05.18 |
申请号 |
EP20040078004 |
申请日期 |
2004.11.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BARTRAY, PETRUS RUTGERUS;BOX, WILHELMUS JOSEPHUS;KUIT, JAN JAAP;LUIJTEN, CARLO CORNELIS MARIA;LUTTIKHUIS, BERNARDUS ANTONIUS JOHANNES;TEN BHOMER, MICHAEL;MIGCHELBRINK, FERDY |
分类号 |
H01L21/027;G02B7/02;G03B27/42;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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