发明名称 |
Method of preventing short circuits in magnetic film stacks |
摘要 |
A method for preventing electrical short circuits in a multi-layer magnetic film stack comprises providing a film stack that includes a layer of magnetic material having an exposed surface. A protective layer is deposited on the exposed surface of the magnetic layer. The protective layer may comprise, for example, a fluorocarbon or a hydrofluorocarbon. The film stack is etched and the protective layer protects the exposed surface from a conductive residue produced while etching the film stack. The method may be used in film stacks to form a magneto-resistive random access memory (MRAM) device.
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申请公布号 |
US6893893(B2) |
申请公布日期 |
2005.05.17 |
申请号 |
US20020235100 |
申请日期 |
2002.09.04 |
申请人 |
NALLAN PADMAPANI C.;KUMAR AJAY;HWANG JENG H.;JIN GUANGXIANG;KERNS RALPH |
发明人 |
NALLAN PADMAPANI C.;KUMAR AJAY;HWANG JENG H.;JIN GUANGXIANG;KERNS RALPH |
分类号 |
H01L21/00;H01L23/00;H01L43/12;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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