发明名称 |
Positive resist composition |
摘要 |
The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
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申请公布号 |
US6893792(B2) |
申请公布日期 |
2005.05.17 |
申请号 |
US20030366673 |
申请日期 |
2003.02.14 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MIYA YOSHIKO;TOISHI KOUJI;HASHIMOTO KAZUHIKO |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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