发明名称 Positive resist composition
摘要 The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
申请公布号 US6893792(B2) 申请公布日期 2005.05.17
申请号 US20030366673 申请日期 2003.02.14
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 MIYA YOSHIKO;TOISHI KOUJI;HASHIMOTO KAZUHIKO
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/039 主分类号 G03F7/004
代理机构 代理人
主权项
地址