| 发明名称 |
STENCIL MASK AND METHOD OF MANUFACTURING THE SAME |
| 摘要 |
A stencil mask has a thin film (11) having an aperture pattern (13). A material layer (14) having heat conductance higher than that of the thin film (11) is set in a region except for a portion (c) of outer edge of the aperture pattern (13) in the side of a principal surface of the thin film (11). <??>The invention further relates to a method for producing such a stencil work. <IMAGE> |
| 申请公布号 |
KR20050045936(A) |
申请公布日期 |
2005.05.17 |
| 申请号 |
KR20040092467 |
申请日期 |
2004.11.12 |
| 申请人 |
ROHM CO., LTD.;SONY CORPORATION |
发明人 |
HIRAKAWA, TADAHIKO;KUMANO, HIROSHI |
| 分类号 |
H01L21/266;G03F1/16;G03F1/20;H01L21/027;H01L21/265;(IPC1-7):H01L21/266 |
主分类号 |
H01L21/266 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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