METHOD FOR LEVELING THE HEATER OF A CHEMICAL VAPOR DEPOSITION SYSTEM AND APPARATUS USING THE SAME,申请号KR20030027257-传众专利搜索

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发明名称	METHOD FOR LEVELING THE HEATER OF A CHEMICAL VAPOR DEPOSITION SYSTEM AND APPARATUS USING THE SAME
摘要
申请公布号	KR100489541(B1)	申请公布日期	2005.05.16
申请号	KR20030027257	申请日期	2003.04.29
申请人		发明人
分类号	H01L21/205;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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