发明名称 THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD
摘要 With a thin film bearing surface of a substrate directed toward an insulation film which is formed on a surface of a quartz plate, the substrate and the quartz plate are moved closer to each other and the insulation film is tightly adhered to the thin film bearing surface (adhering process). The quartz plate alone is then selectively peeled off, thereby completing transfer of the insulation film onto the substrate (peeling process). In this manner, the insulation film is disposed on the thin film bearing surface of the substrate, and a transportation mechanism then houses the substrate in a substrate cassette. Meanwhile, after the quartz plate is transported by the transportation mechanism to a cleaning unit and cleaned by the cleaning unit (cleaning process), the quartz plate is returned to a plate-like member cassette and waits in this cassette until reused next time.
申请公布号 KR100489761(B1) 申请公布日期 2005.05.16
申请号 KR20020062674 申请日期 2002.10.15
申请人 发明人
分类号 H01L21/20;H01L21/31;B32B38/10;H01L21/316;(IPC1-7):H01L21/20 主分类号 H01L21/20
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