发明名称 REACTION SYSTEM FOR GROWING A THIN FILM
摘要 A reactor defines a reaction chamber for processing a substrate. The reactor comprises a first inlet for providing a first reactant and to the reaction chamber and a second inlet for a second reactant to the reaction chamber. A first exhaust outlet removes gases from the reaction chamber. A second exhaust outlet removes gases from the reaction chamber. A flow control system is configured to alternately constrict flow through the first and second exhaust outlets. The reactor chamber is configured to for a diffusion barrier within the reaction chamber.
申请公布号 WO2005042160(A2) 申请公布日期 2005.05.12
申请号 WO2004US36301 申请日期 2004.10.29
申请人 ASM AMERICA, INC.;SHERO, ERIC, J.;MOHITH, VERGHESE, E. 发明人 SHERO, ERIC, J.;MOHITH, VERGHESE, E.
分类号 C23C16/44;C23C16/455;C25F1/00;F26B3/00;H01L21/00 主分类号 C23C16/44
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