发明名称 Composite material, wafer holding member and method for manufacturing the same
摘要 A composite material according to the present invention, is composed of SiC, SiO<SUB>2</SUB>, at least one out of Al and Si, with He leak rate of 1.3x10<SUP>-10 </SUP>Pa.m<SUP>3</SUP>/sec or below, thereby providing a composite material, which has a higher vacuum air-tightness, an excellent thermal conductivity, an adjustable coefficient of thermal expansion, small variation in strength and higher reliability, and a method for manufacturing the composite material, and a wafer holding member including the composite material.
申请公布号 US2005101082(A1) 申请公布日期 2005.05.12
申请号 US20040974560 申请日期 2004.10.27
申请人 KYOCERA CORPORATION 发明人 YOKOYAMA KIYOSHI;ITONAGA NAOKO
分类号 H01L21/68;B32B18/00;C04B35/565;C04B35/581;C04B35/653;C04B37/02;C23C16/458;H01L21/00;H01L21/02;(IPC1-7):H01L21/46 主分类号 H01L21/68
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