SEMICONDUCTOR THIN FILM, ITS MANUFACTURING METHOD, AND THIN FILM TRANSISTOR USING THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor thin film by which a region crystallized generally toward one direction and having no grain boundary in the direction of a crystal growth can be homogeneously formed at an arbitrary location in the semiconductor thin film. SOLUTION: The method for manufacturing a semiconductor thin film comprises steps of forming at least a semiconductor thin film on a substrate, forming an anti-reflection film pattern and a reflection film pattern on the semiconductor thin film to be adjacent to each other, and forming direction-aligned semiconductor grains in the lower part of the anti-reflection film pattern by applying a first laser beam from the above side of the substrate. COPYRIGHT: (C)2005,JPO&NCIPI