发明名称 SLIT EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To improve throughput, while maintaining the scanning quality, in a slit exposure device for scanning an object to be exposed with a line light from a light source via a slit screen. SOLUTION: The slit exposure device 1 is composed of an endless belt 20, provided with a linear light transmission part 20a extending in the direction perpendicular to the circumferential direction R, in which an area other than the light transmission part 20a shields the light; two rolls 31 and 32 for stretching the endless belt 20; a driving means 30 for rotating the roll 31; the surface light source 40, as the light source part, provided inside the endless belt 20; and a control means 35 for controlling the driving means 30 and the surface light source 40. The read surface of the object to be exposed is scanned by the line light, by making the roll 31 rotatively driven by driving means 30 to have the endless belt 20 rotated in the circumferential direction R so that the light transmission part 20a is moved in the rotating direction R. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005121848(A) 申请公布日期 2005.05.12
申请号 JP20030355811 申请日期 2003.10.16
申请人 FUJI PHOTO FILM CO LTD 发明人 YAGI KEIICHI
分类号 G01T1/00;G01T1/24;G01T7/00;G03B42/02;H04N1/04;(IPC1-7):G03B42/02 主分类号 G01T1/00
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