发明名称 Method of breaking down a fuse in a semiconductor device
摘要 A semiconductor device has: a fuse having one end applied with a first voltage, and a MOS transistor having source, gate and drain and a connection point between the other end of the fuse and one of the source and drain, a second voltage lower than the first voltage applied to the other of the source and drain, wherein: the first and second voltages, characteristics of the MOS transistor and a resistance of the fuse are selected so that the fuse can be broken down when a predetermined program voltage is applied to the gate; and the resistance of the fuse is set to such a value as a voltage difference between a voltage at the connection point and the second voltage is lower than a drain voltage of the MOS transistor at which a drain current starts saturating, when the program voltage is applied to the gate.
申请公布号 US2005099860(A1) 申请公布日期 2005.05.12
申请号 US20040015030 申请日期 2004.12.20
申请人 KAMIYA TAKAYUKI;OMURA MASAYOSHI 发明人 KAMIYA TAKAYUKI;OMURA MASAYOSHI
分类号 H01L21/82;H01L23/525;(IPC1-7):G11C7/00 主分类号 H01L21/82
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