| 发明名称 |
PARTICLE-FREE POLISHING FLUID FOR PLANARIZING NICKEL BASE COATING |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing fluid which can set the surface roughness of a magnetic disk to less than 2Å. <P>SOLUTION: The particle-free polishing fluid contains at least one oxidizing agent or a mixture thereof. The particle-free polishing fluid may contain an accelerating agent and/or a complexing agent. If polishing of the magnetic disk is carried out by using the particle-free polishing fluid in the final step of polishing work, the surface roughness of less than about 1.51Åis achieved. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005118982(A) |
申请公布日期 |
2005.05.12 |
| 申请号 |
JP20040249453 |
申请日期 |
2004.08.30 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC |
发明人 |
AMEEN JOSEPH G;HUYNH DAVE;LIU ZHENDONG;QUANCI JOHN;VESPA LILLIAN |
| 分类号 |
B24B37/00;B24B1/00;B24B7/19;B24B7/30;C09G1/04;C09K3/14;C09K13/00;C23F3/06;(IPC1-7):B24B37/00 |
主分类号 |
B24B37/00 |
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