发明名称 |
Method of forming thin film |
摘要 |
A method of forming a thin film capable of forming a thin film of uniform thickness in a predetermined part without using any mask even in the case where there exist a part on which a thin film is formed and a part on which no thin film is formed is provided. Wettability of the surface of the part on which no thin film is formed is made lower than wettability of the surface of the part on which the thin film is formed.
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申请公布号 |
US2005101041(A1) |
申请公布日期 |
2005.05.12 |
申请号 |
US20040980806 |
申请日期 |
2004.11.04 |
申请人 |
PIONEER CORPORATION |
发明人 |
KUBOTA HIROFUMI |
分类号 |
H05B33/10;H01L21/00;H01L21/84;H01L51/00;H01L51/50;H01L51/56;H05B33/14;H05B33/22;(IPC1-7):H01L21/00 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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