发明名称 |
ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF |
摘要 |
<p>Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high- boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.</p> |
申请公布号 |
KR20050044501(A) |
申请公布日期 |
2005.05.12 |
申请号 |
KR20047007488 |
申请日期 |
2004.05.15 |
申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
BALDWIN, TERESA;BEDWELL, WILLIAM;HEBERT, MELLO;IWAMOTO, NANCY;KENNEDY, JOSEPH;NAKANO, TADASHI;STUCK, JASON;SUEDMEYER, ARLENE |
分类号 |
G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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