| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a stable fine pattern with a perpendicular profile, even when the absorbance of a photoresist resin with respect to a light source is relatively high. <P>SOLUTION: The new photoresist overcoating composition is prepared by introducing a substance which stably weakens acid into an overcoating composition. Because the substance is diffused uniformly into a photoresist film laid under the overcoat and neutralizes an acid produced in a large amount in the upper part of the photoresist, the vertical distribution of the acid is made uniform and a fine pattern having ≤100 nm width and a perpendicular profile can be obtained. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
