Semiconductor wafer processing mask set mask inspection procedure overlays registered structure patterns in successive images of different masks for comparison with stored reference

摘要

A semiconductor wafer processing mask set mask (6, 8) inspection procedure overlays and compares registered structure patterns (16, 18) in successive images (30, 31) of different masks to give a combined image (33) and compares it with reference image (35) of the required resist pattern for defect classification. Independent claims are included for equipment using the procedure.