发明名称 |
Method and device for vacuum-coating a substrate |
摘要 |
A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.
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申请公布号 |
US2005098119(A1) |
申请公布日期 |
2005.05.12 |
申请号 |
US20040008413 |
申请日期 |
2004.12.09 |
申请人 |
BURGER KURT;WEBER THOMAS;VOIGT JOHANNES;LUCAS SUSANNE |
发明人 |
BURGER KURT;WEBER THOMAS;VOIGT JOHANNES;LUCAS SUSANNE |
分类号 |
B23B27/14;C23C8/36;C23C14/06;C23C14/22;C23C16/27;C23C16/30;C23C16/50;C23C16/503;C23C28/04;H01J37/32;(IPC1-7):C23C16/00 |
主分类号 |
B23B27/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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