| 摘要 |
An exposure apparatus forming a predetermined pattern on a substrate by using exposure light. The exposure apparatus has a stage apparatus movable relative to the optical axis of the exposure light; a light transmitting member, to the upper part of which is fed a liquid; and a detection apparatus capable of being positioned below the light transmitting member at the time of detection. A liquid for exposure is prevented from leaking and entering optical measuring equipment including a wave aberration measuring instrument, and as a result, optical adjustment such as image performance and optical characteristics can be excellently performed. |
