发明名称 Stencil mask and method of producing the same
摘要 To provide a stencil mask that the heat generated in the surface of the stencil mask can be radiated to a supporting substrate supporting a portion around the edge of a thin film quickly and a method of producing the same. A stencil mask has a thin film having an aperture pattern and a supporting substrate supporting a portion around the edge of a thin film and a method of producing the same, and a stencil mask and the method of producing the same has an aspect that a plug that having heat conductance higher than that of a thin film and a supporting substrate is embedded in a state of contacting a thin film and reaches inside of a supporting substrate.
申请公布号 US2005100801(A1) 申请公布日期 2005.05.12
申请号 US20040983726 申请日期 2004.11.09
申请人 ROHM CO., LTD. 发明人 HIRAKAWA TADAHIKO;KUMANO HIROSHI
分类号 G03F1/16;G03F1/20;H01L21/027;H01L21/266;H01L21/302;H01L23/12;(IPC1-7):G03F9/00;G03C5/00 主分类号 G03F1/16
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