发明名称 |
Stencil mask and method of producing the same |
摘要 |
To provide a stencil mask that the heat generated in the surface of the stencil mask can be radiated to a supporting substrate supporting a portion around the edge of a thin film quickly and a method of producing the same. A stencil mask has a thin film having an aperture pattern and a supporting substrate supporting a portion around the edge of a thin film and a method of producing the same, and a stencil mask and the method of producing the same has an aspect that a plug that having heat conductance higher than that of a thin film and a supporting substrate is embedded in a state of contacting a thin film and reaches inside of a supporting substrate. |
申请公布号 |
US2005100801(A1) |
申请公布日期 |
2005.05.12 |
申请号 |
US20040983726 |
申请日期 |
2004.11.09 |
申请人 |
ROHM CO., LTD. |
发明人 |
HIRAKAWA TADAHIKO;KUMANO HIROSHI |
分类号 |
G03F1/16;G03F1/20;H01L21/027;H01L21/266;H01L21/302;H01L23/12;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|