DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURED BY APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithographic apparatus, and a device manufactured by it. SOLUTION: The device manufacturing method includes the steps of supplying a substrate W, supplying a projection radiation beam PB by using an illumination system IL, using a patterning means MA so as to furnish a pattern to a cross-section of the projection beam PB, sequentially projecting the patterned radiation beam PB to some external target parts CO of the substrate W, prior to projecting the beam on an internal target part CI of the substrate W, and separating each of the continuous external target parts COi+1, by spaces from external target parts COithat precede the continuous external parts COi+1. COPYRIGHT: (C)2005,JPO&NCIPI